HOME/Tech Tree/Product
PH-E-018

EBL (Electron beam lithography)

Photonic장비공정 장비
PRODUCT

Technical Description

Forms fine patterns using an electron gun

Specifications

Wavelength band 210–2500 nm (UV–visible–NIR)

Opinions on This Product

Opinions are collected on the Korean page.

Go to the Korean page
Interested in technology cooperation for this product?

Register your available or needed technologies and the Council matching committee will review them for cooperation matching.

Submit a Cooperation Proposal →