HOME/Tech Tree/Product
PH-M-023

질산(HNO3)

Photonic소재습식 식각용 재료
PRODUCT

Technical Description

For metal and semiconductor wet etching

Specifications

Concentration 69%, purity 99.99%

Opinions on This Product

Opinions are collected on the Korean page.

Go to the Korean page
Interested in technology cooperation for this product?

Register your available or needed technologies and the Council matching committee will review them for cooperation matching.

Submit a Cooperation Proposal →